Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, The Institute of Electrical Engineers of Japan ... (et al.); co-organized by Yokohama City (Japan); published by SPIE--The International Society for Optical Engineering
Date
[2004]
Series
Proceedings of SPIE--the International Society for Optical Engineering ; v. 5446