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Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Available as
- Physical
Details
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- Creator
- Elizabeth A. Dobisz, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH
- Other Titles
-
- Emerging lithographic technologies 5
- Emerging lithographic technologies five
- Format
- Books
- Language
- English
- Contributors
- Publication
-
- Bellingham, Washington : SPIE, [2001]
- ©2001
- Physical Details
-
- xv, 818 pages : illustrations (some color) ; 28 cm
- ISBNs
- 9780819440297, 0819440299
- OCLC
- ocm48153041
- Includes bibliographic references and author index.