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Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland
- Available as
- Online
- Physical
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- Creator
- Chris A. Mack, Tom Stevenson, chairs/editors ; sponsored by EOS--European Optical Society, SPIE--the International Society for Optical Engineering [and] Commission of the European Communities, Directorate General for Science, Research, and Development ; cosponsored by Scottish Enterprise [and] Sira Technology Centre (UK) ; cooperating organization, IEE--the Institution of Electrical Engineers (UK)
- Format
- Books
- Language
- English
- Contributors
- Publication
-
- Bellingham, Wash., USA : SPIE, [1999]
- ©1999
- Series
- Physical Details
-
- vii, 262 pages : illustrations ; 28 cm
- ISBNs
- 0819432210, 9780819432216
- OCLC
- ocm41549745
- Includes bibliographic references and author index.