Website Search
Find information on spaces, staff, and services.
Catalog Search
Books
Metrology, inspection, and process control for microlithography X : 11-13 March, 1996, Santa Clara, California
- Available as
- Physical
Details
Checking for availability...
- Creator
- Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH
- Other Title
-
- Integrated circuit metrology, inspection, and process control
- Format
- Books
- Language
- English
- Contributors
- Publication
-
- Bellingham, Wash., USA : SPIE, [1996]
- ©1996
- Physical Details
-
- xiii, 802 pages : illustrations ; 28 cm
- ISBNs
- 9780819421012, 0819421014
- OCLC
- ocm35193019
- Previous volumes entitled: Integrated circuit metrology, inspection and process control.
- Includes bibliographic references and author index.