Website Search
Find information on spaces, staff, and services.
Catalog Search
Books
Advances in resist technology and processing XI : 28 February-1 March 1994, San Jose, California
- Conferences
- SPIE Symposium on Microlithography (1994 : San Jose, Calif.)
- Available as
- Online
- Physical
Details
Checking for availability...
- Creator
- Omkaram Nalamasu, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International
- Format
- Books
- Language
- English
- Contributors
- Publication
-
- Bellingham, Wash., USA : SPIE, [1994]
- ©1994
- Physical Details
-
- xiii, 880 pages : illustrations ; 28 cm
- ISBNs
- 9780819414908, 0819414905
- OCLC
- ocm30641637
- "... held in conjunction with SPIE's 1994 Symposium on Microlithography ..."--P. xiii.
- Includes bibliographical references and author index.