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A statistical analysis of polysilicon etching in a chlorine-argon plasma
- Author / Creator
- Available as
- Physical
Details
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- Creator
- by L. A. Tully, J. L. Shohet, J. A. Graham, R. Kopitzke
- Format
- Manuscripts, Theses
- Language
- English
- Publication
-
- 1987
- Physical Details
-
- 31 leaves, 19 unnumbered leaves of plates : illustrations ; 28 cm
- OCLC
- ocn962026391
- Typescript.
- Advisor: Professor J. L. Shohet
- A report submitted in partial fulfillment of the requirements for the degree of Master of Science in Electrical and Computer Engineering.
- M.S. University of Wisconsin--Madison 1987.
- Includes bibliographical references.