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Synthesis and engineering of nanostructures by energetic ions
- Available as
- Online
Details
- Creator
- Devesh Kumar Avasthi and Jean Claude Pivin, editors
- Format
- Books
- Language
- English
- Contributors
- Publication
-
- 1st ed
- New York : Nova Science Publishers, Inc., c2012
- Physical Details
-
- 1 online resource (390 p.)
- ISBNs
- 9781621002376, 1621002373, 1616682094
- OCLC
- ocn757395191
- Description based upon print version of record.
- Includes bibliographical references and index.
- English
- Intro -- SYNTHESIS AND ENGINEERING OF NANOSTRUCTURES BY ENERGETIC IONS -- SYNTHESIS AND ENGINEERING OF NANOSTRUCTURES BY ENERGETIC IONS -- CONTENTS -- PREFACE -- A. SYNTHESIS OF NANOCOMPOSITE THIN FILM AND NANOSTRUCTURES AT SURFACE BY LOW ENERGY ION BEAMS -- ENERGETIC ION BEAMS IN NANOSTRUCTURING: AN OVERVIEW -- 1. INTRODUCTION: -- 2. ION OF ENERGIES UPTO A FEW MEV IN SYNTHESIS OF NANOSTRUCTURES -- 2.1. Synthesis of Nanocomposite Thin Films by Atom Beam Co-Sputtering -- 2.2. Creation of Nanoripples at Surface by KeV Ion Beams -- 2.3. Buried Nanostructures by Ion Implantation -- 2.4. Buried Nanostructures by Ion Beam Mixing -- 2.5. Precipitation Resulting from Electronic Energy Deposited by Ions -- 3. HIGH ENERGY (SWIFT HEAVY IONS) IN SYNTHESIS OF THE NANOSTRUCTURES -- 3.1. Creation of Carbon Nanowire in Si Based Gels -- 3.2. Creation of Carbon Nanowires in Fullerene -- 3.3. Si and Ge Nanoparticles by SHI Irradiation of Si and Ge Suboxide -- 3.4. Reduction of Copper Oxide Nanoparticles by SHI -- 3.5. Latent Tracks as Templates for Nanostructures -- 3.6. Ion Tracks in Polymers for Grafting Functional Monomers -- 4. HIGH ENERGY (SWIFT HEAVY IONS) IN MODIFYING THE NANOSTRUCTURES -- 4.1. Engineering the Size of Buried Nanostructures -- 4.2. Engineering the Shape of Nanoparticles Embedded in Silica -- 4.3. Influence of SHI on Magnetic Nanoparticles of Fe Embedded in Silica -- 5. FOCUSED ION BEAMS FOR NANO STRUCTURES -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- NANOFABRICATION BY FOCUSED ION BEAMS -- ABSTRACT -- 1. INTRODUCTION -- 2. FOCUSED ION BEAM SYSTEM -- 3. PRINCIPLES OF FIB MICRO FABRICATION -- 4. FABRICATION STEPS -- 5. APPLICATION WITH EXAMPLES -- 5.1 Nanostructures by FIB Milling -- 5.2 3D nanostructures by FIB CVD deposition -- 5.3 Morphology and Stoichiometry -- 5.4 Nano Size Sensors -- SUMMARY -- ACKNOWLEDGMENT -- REFERENCES
- SYNTHESIS OF NANOCOMPOSITE THIN FILMS BY ATOM BEAM CO-SPUTTERING -- ABSTRACT -- 1. INTRODUCTION -- 2. ATOM BEAM SPUTTERING SET UP FOR SYNTHESIS OF NANOCOMPOSITE THIN FILMS -- 3. SYNTHESIS AND CHARACTERIZATION OF PLASMONIC NANOCOMPOSITES -- 3.1. Gold-Silica Nanocomposites -- 3.2. Au-Si Core-Shell Nps Embedded in Silica -- 4. SYNTHESIS AND CHARACTERIZATION OF GE-SILICA NANOCOMPOSITES -- 5. SYNTHESIS ND CHARACTERIZATION OF NI DOPED ZNO -- 6. MECHANISM OF NUCLEATION AND GROWTH OF NPS IN THE CO-SPUTTERING PROCESS -- CONCLUSION -- REFERENCES -- LOW ENERGY ION BEAM ASSISTED DEPOSITION OF TIN-NI NANOCOMPOSITE COATINGS -- ABSTRACT -- 1. INTRODUCTION -- 2. DEPOSITION AND CHARACTERIZATION OF HARD COATINGS (TIN-NI NANOCOMPOSITES) -- 2.1. Deposition -- 2.2. Chemical Composition and Phase Characterization -- 2.3. Residual Stress Measurement -- 2.4. Hardness and Tribology -- 3. ANALYSIS OF CHARACTERIZATION OF TIN-NI NANOCOMPOSITE THIN FILM -- 3.1. Chemical Composition and Microstructural Analysis -- 3.2. Internal Stresses -- 3.3. Hardness and Thermal Stability -- 3.4. Wear Resistance -- 3.5. Qualitative Coating Toughness Evaluation -- DISCUSSION- CONCLUSION -- REFERENCES -- NANOSTRUCTURED SOFT MAGNETIC FILMS: ELABORATION, PERFORMANCES AND APPLICATIONS FOR TRILAYERED SENSORS BASED ON MAGNETO-IMPEDANCE EFFECT -- ABSTRACT -- 1. INTRODUCTION -- 2. WHY A MI SENSOR? WHY TRILAYERED STRUCTURE? WHY INDUSTRY WANTS TO REDUCE SENSOR SIZE? -- 3. ELABORATION ROUTE AND CHARACTERIZATIONS -- 4. BENEFITS OF ANNEALINGS -- 5. SENSOR: FIRST MAGNETO-IMPEDANCE RESULTS -- CONCLUSION -- ACKNOWLEDGMNTS -- REFERENCES -- FORMATION AND INTERROGATION OF METAL AND SEMICONDUCTOR NANOSTRUCTURES BY KEV ION BEAMS -- ABSTRACT -- 1. INTRODUCTION -- 2. THEORY OF ION INDUCED SURFACE MORPHOLOGY -- SURFACE DIFFUSION -- 2.1. Linear B-H Equation -- LIMITATIONS OF THE LINEAR B-H EQUATION
- 2.2. The Continuum Equation of Makeev, Cuerno and Barabasi (MCB) for Ion Bombarded Surface -- 3. A BRIEF REVIEW OF ION INDUCED SURFACE MORPHOLOGY -- 3.1. Ion Induced Kinetic Roughening -- 3.2. Formation of Regular Structures by Ion Bombardment -- 4. ION INDUCED NANOSTRUCTURES ON METAL THIN FILMS -- 4.1. Kinetic Roughening of Thin Pt Films on Si Substrate -- 4.2. ION BEAM SPUTTERING INDUCED DOT AND RIPPLE FORMATION IN THIN METAL FILMS -- Variation of Surface Morphology with Ion Incidence Angle -- Metal Dot Formation -- Metal Ripple Formation -- 4.3. FORMATION AND INTERROGATION OF AU NANO CLUSTER BY ION BEAMS -- 5. ION INDUCED NANOSTRUCTURES ON SEMICONDUCTORS -- 5.1. Formation of Ripples and Faceted Structures on Oxygen Bombarded Si Surface -- 5.2. Coulomb Explosion Sputtering of Oxidized Nano Structure -- 5.3. Role of Initial Surface Roughness on Ion Induced Surface Morphology -- SUMMARY -- ACKNOWLEDGMENTS -- REFERENCES -- X-RAY SCATTERING STUDIES OF NANODOT PATTERN FORMATION ON SEMICONDUCTOR SURFACES BY LOW ENERGY ION BEAM SPUTTERING -- ABSTRACT -- 1. INTRODUCTION -- 2. GRAZING-INCIDENCE X-RAY SCATTERING TECHNIQUES -- 3. EXPERIMENTAL DETAILS -- 3.1. Self-Organized Nanopattern Production -- 3.2 Pattern Characterization -- 4 - EXPERIMENTAL OBSERVATIONS AND DISCUSSION -- 4.1 Temperature Dependence of Nanopattern Formation on Si(001) -- 4.2 In-Situ Study of Nanopattern Formation on Gasb(001) -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- B. SYNTHESIS OF BURIED NANOSTRUCTURES BY ION IMPLANTATION PROCESS -- CONTROLLING IRRADIATION-INDUCED QUANTUM DOT SYNTHESIS -- ABSTRACT -- 1. INTRODUCTION -- 2. WHAT DETERMINES THE NC RADIUS AND SIZE DISTRIBUTION? -- 2.1 Nucleation -- 2.2 Growth and Coarsening -- 3. ROLE OF CHEMISTRY IN BEAM-INDUCED NC NUCLEATION AND GROWTH -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES
- SYNTHESIS AND PACKAGING OF NANOCRYSTALS BY ULTRA LOW ENERGY ION IMPLANTATION FOR APPLICATIONS IN ELECTRONICS, OPTICS AND PLASMONICS -- ABSTRACT -- 1. INTRODUCTION -- 2. THE ULE-IBS METHOD -- 2.1 The Classical IBS Method for the Fabrication of Nanocrystals -- 2.2 Advantages of the ULE-IBS Method -- 3. DEPTH POSITIONING OF THE NCS LAYERS WITHIN THE MATRIX -- 4. OPTIMIZATION OF THE NCS DENSITY -- 4.1 The "Dose Loss" Problem in Si Implanted SiO2 -- 4.2 Anomalous Swelling of the SiO2 Layers -- 5. HUMIDITY PENETRATION INTO IMPLANTED LAYERS -- 6. NCS PASSIVATION AND OXIDE HEALING -- 7. APPLICATIONS -- 7.1Nanocrystal Memory Devices -- 7.2 Plasmonic Nanostructures -- CONCLUSION AND FUTURE DIRECTIONS -- REFERENCES -- NANOMETRIC BUBBLE FORMATION IN SIO2 BY ION IMPLANTATION: INFLUENCE OF THE SUBSTRATE -- ABSTRACT: -- 1. INTRODUCTION -- 2. EXPERIMENTAL CONDITIONS -- 3. CHARACTERIZATION OF NANO SIZE KR BUBBLES IN SI02 -- 3.1. Thermal Si02 -- 3.2. CVD SiO2 -- 3.3. Densified SiO2 -- 3.4 Discussion -- 4. CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY STUDIES OF ION BEAM INDUCED MODIFICATIONS IN GOLD NANOSTRUCTURES ON SILICON: SPUTTERING AND ENHANCED DIFFUSION -- ABSTRACT -- INTRODUCTION -- Transmission Electron Microscopy (TEM): -- Uses of Electron Microscopy: -- (A) Determination of Size and Size Distributions: -- (B) Determination of Crystalline Structure: Value of "D", Inter-Planar Spacing -- Sample Preparation -- Ion - Solid Interactions at Nanoscale Regime: -- Experimental Methods -- RESULTS AND DISCUSSIONS: -- (I) Sputtering from AU Nanostructures: -- Enhanced Diffusion in Substrate under High Flux Conditions: -- CONCLUSIONS -- ACKNOWLEDGMENTS -- REFERENCES -- SYNTHESIS AND STUDY OF NANOSCALE MAGNETIC SEMICONDUCTOR AND MAGNETIC METAL/INSULATOR FILMS: ROLE OF ENERGETIC IONS -- ABSTRACT -- 1. INTRODUCTION
- 1.1. Zinc Oxide Based Diluted Magnetic Semiconductor -- 1.1.1. Diluted Magnetic Semiconductor: Material Aspects and Importance -- 1.1.2. Mechanism behind Ferromagnetism -- 1.1.3. Important experimental results of ZnO based DMS -- 1.1.4. Role of Energetic Ions -- 1.2. Metal-Insulator Nanophase Composite Films -- 1.2.1. Material Aspects and Importance -- 1.2.2. Role of Energetic Ions -- 2. SYNTHESIS AND STUDY OF NI DOPED/IMPLANTED ZNO FILMS -- 2.1. Room Temperature Transparent Ferromagnetism in Ni Doped Zno Films -- 2.2. Studies on DMS Properties of 200 Kev Ni+2 Ion Implanted ZnO Films -- 3. SYNTHESIS AND STUDY OF NI :SILICA NANOGRANULAR FILM -- 3.1. Composition Analysis of Ni-SiO2 Films -- 3.2. Correlation Between Properties of Ni:SiO2 Films with Composition and Microstructure -- 5. CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- C. SWIFT HEAVY IONS IN SYNTHESIS AND MODIFICATION OF NANODIMENSIONAL SYSTEMS -- ION TRACKS IN POLYMERS -- ABSTRACT -- 1. INTRODUCTION -- 2. TRACK ETCHED POROUS MEMBRANES AND TEMPLATES -- 3. GRAFTING IN POLYMERIC MEMBRANES -- 4. CLUSTERS SYNTHESIS IN SEMI-ORGANIC POLYMERS: -- 5. CONCLUSIONS -- REFERENCES -- SWIFT HEAVY-IONS FOR CONTROLLED MODIFICATIONS OF MAGNETIC THIN FILMS AND MULTILAYERS -- ABSTRACT -- 1. INTRODUCTION -- 2. STRESS RELAXATION IN SOFT MAGNETIC FILMS USING SWIFT HEAVY IONS -- 2.1. Diffusion Measurements -- 3. CONTROLLED VARIATION IN INTERFACE ROUGHNESS USING SWIFT HEAVY ION IRRADIATION -- 4. SWIFT HEAVY ION INDUCED MIXING AT THE INTERFACES IN MULTILAYERS -- 4.1. Comparison of the Mixing Efficiencies of Different Metals with Si -- 4.2. Depth-Resolved XAFS Study of SHI Induced Phase Formation -- 4.3. Asymmetry of Intermixing Induced by Swift Heavy Ions at the Interfaces -- CONCLUSIONS -- REFERENCES -- ION BEAM INDUCED FORMATION OF CONDUCTING TRACKS IN FULLERENE FILMS -- ABSTRACT -- 1. INTRODUCTION
- Surface Probe Microscopy